发明名称 MANUFACTURING METHOD OF MICROLENS ARRAY SUBSTRATE, AND MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a microlens array substrate and a manufacturing method of an electro-optic device that enable suppression of removals of cracks of lens layers and alignment marks thereof.SOLUTION: A manufacturing method of a microlens array substrate 10 comprises the steps of: forming an alignment mark 17 on a top surface 11a of a substrate 11; forming a plurality of recesses 12 on the top surface 11a of the substrate 11; forming on the top surface 11a of the substrate 11 a translucent material layer 13a having a plurality of recesses 14 having a shape of the plurality of recesses 12 reflected so as to cover the alignment mark 17 and the plurality of recesses 12; forming a translucent material layer 15a having a refractive index different from the translucent material layer 13a so as to cover the translucent material layer 13a and embed the plurality of recesses 14; and implementing flatness treatment to the translucent material layer 15a so that the translucent material layer 13a is exposed at a boundary part between the plurality of adjacent recesses 14 and the alignment mark 17 is not exposed.
申请公布号 JP2015049468(A) 申请公布日期 2015.03.16
申请号 JP20130182843 申请日期 2013.09.04
申请人 SEIKO EPSON CORP 发明人 OZAWA NOBUHIKO
分类号 G02B3/00;G02F1/1333;G02F1/1335 主分类号 G02B3/00
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