发明名称 |
MANUFACTURING METHOD OF MICROLENS ARRAY SUBSTRATE, AND MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a microlens array substrate and a manufacturing method of an electro-optic device that enable suppression of removals of cracks of lens layers and alignment marks thereof.SOLUTION: A manufacturing method of a microlens array substrate 10 comprises the steps of: forming an alignment mark 17 on a top surface 11a of a substrate 11; forming a plurality of recesses 12 on the top surface 11a of the substrate 11; forming on the top surface 11a of the substrate 11 a translucent material layer 13a having a plurality of recesses 14 having a shape of the plurality of recesses 12 reflected so as to cover the alignment mark 17 and the plurality of recesses 12; forming a translucent material layer 15a having a refractive index different from the translucent material layer 13a so as to cover the translucent material layer 13a and embed the plurality of recesses 14; and implementing flatness treatment to the translucent material layer 15a so that the translucent material layer 13a is exposed at a boundary part between the plurality of adjacent recesses 14 and the alignment mark 17 is not exposed. |
申请公布号 |
JP2015049468(A) |
申请公布日期 |
2015.03.16 |
申请号 |
JP20130182843 |
申请日期 |
2013.09.04 |
申请人 |
SEIKO EPSON CORP |
发明人 |
OZAWA NOBUHIKO |
分类号 |
G02B3/00;G02F1/1333;G02F1/1335 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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