| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an inspection device and an inspection method that find importance information applicable to an inspection other than an application of a pattern to be able to reduce unnecessary defect detection using the information.SOLUTION: An inspection device acquires an optical image of a pattern, compares the optical image with a reference image, and determines that it is defective when a difference exceeds a threshold determined using importance information. The importance information is at least one information of drawing data input into a drawing device that draws a pattern, resize processing to drawing data or design data to be a basis of the drawing data, addition of an auxiliary pattern to the drawing data or the design data, correction processing to a drawing condition of the drawing device set to the drawing data, and a log of the drawing device. The importance information preferably includes information on application of a pattern.</p> |
