发明名称 MASK BLANK, MASK FOR TRANSFER AND METHOD OF PRODUCING MASK BLANK
摘要 <p>PROBLEM TO BE SOLVED: To provide a mask blank which can facilitate detection of defects further in a defect inspection, a mask for transfer and a method of producing a mask blank.SOLUTION: A mask blank 10 has a light transmissive substrate 20, a first film 12 and a second film 14, and the first film 12 and the second film 14 are laminated, in this order, on the light transmissive substrate 20. The first film 12 and the second film 14 are both composed of a material containing one or more elements selected from metals and silicon. The difference calculated by subtracting the surface reflectivity of the first film 12 to the light of a specified wavelength in a state where no other film is laminated on the first film 12 from the surface reflectivity of the second film 14 to the light of the specified wavelength in a state where the second film 14 is laminated on the first film 12 is 10% or smaller.</p>
申请公布号 JP2015049455(A) 申请公布日期 2015.03.16
申请号 JP20130182375 申请日期 2013.09.03
申请人 HOYA CORP 发明人 AOYAMA KAZUKI;KOMINATO ATSUSHI
分类号 G03F1/50;G03F1/84;H01L21/027 主分类号 G03F1/50
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