METHOD AND DEVICE FOR MEASURING A THIN FILM THICKNESS

摘要

According to the present invention, a method for measuring the thickness of a thin film comprises: forming the thin film on a substrate on which a pattern area with an element pattern and a peripheral area surrounding the pattern area are formed; forming sampling openings formed on the thin film and exposing the surface of the substrate; measuring the reflection coefficient of the substrate based on sampled incident light emitted to the sampling opening and sampled light reflected by the substrate; and measuring the thickness of the thin film based on measured incident light emitted to the thin film, measured light reflected by the thin film, and a reflection coefficient.