发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To easily form a semiconductor device including a plurality of capacitors having different characteristics respectively.SOLUTION: A capacity cell 60 includes: a first electrode 61 and a second electrode 62 which are formed on an interlayer insulating film 42; and a dielectric film 63 interposed between the first electrode 61 and the second electrode 62. A cell capacitor 50 includes a lower electrode 51, a ferroelectric 52 and an upper electrode 53 which are laminated. The film thickness of the ferroelectric 52 is set corresponding to reduced voltage of the working voltage of a memory cell. By setting a distance between the first electrode 61 and the second electrode 62, a capacity cell 60 having a capacity value that is set regardless of the film thickness of the dielectric film 63 can be obtained.</p> |
申请公布号 |
JP2015050241(A) |
申请公布日期 |
2015.03.16 |
申请号 |
JP20130179487 |
申请日期 |
2013.08.30 |
申请人 |
FUJITSU SEMICONDUCTOR LTD |
发明人 |
OKITA YOICHI |
分类号 |
H01L21/8246;H01L27/10;H01L27/105 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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