发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To easily form a semiconductor device including a plurality of capacitors having different characteristics respectively.SOLUTION: A capacity cell 60 includes: a first electrode 61 and a second electrode 62 which are formed on an interlayer insulating film 42; and a dielectric film 63 interposed between the first electrode 61 and the second electrode 62. A cell capacitor 50 includes a lower electrode 51, a ferroelectric 52 and an upper electrode 53 which are laminated. The film thickness of the ferroelectric 52 is set corresponding to reduced voltage of the working voltage of a memory cell. By setting a distance between the first electrode 61 and the second electrode 62, a capacity cell 60 having a capacity value that is set regardless of the film thickness of the dielectric film 63 can be obtained.</p>
申请公布号 JP2015050241(A) 申请公布日期 2015.03.16
申请号 JP20130179487 申请日期 2013.08.30
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 OKITA YOICHI
分类号 H01L21/8246;H01L27/10;H01L27/105 主分类号 H01L21/8246
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