APPARATUS FOR ETCHING GRAPHENE AND ETCHING METHOD USING THE SAME OF

摘要

In the present invention, disclosed is a graphene etching apparatus comprising a vacuum chamber; a stage which is installed in the vacuum chamber and has graphene pattern layers wherein the graphene pattern layers are seated; and a power supplying part which assigns power to the graphene pattern. In the present invention, provided are a graphene etching apparatus, which prevents the modification of electrodes connected to the graphene pattern layer according to the reduction of energy consumption, and an etching method using the same.