| 摘要 |
THE PRESENT INVENTION PROVIDES A CHEMICAL-MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING AN AMINO COMPOUND, A RADICAL-FORMING OXIDIZING AGENT, A RADICAL TRAPPING AGENT CAPABLE OF INHIBITING RADICAL-INDUCED OXIDATION OF THE AMINO COMPOUND, AND AN AQUEOUS CARRIER THEREFORE. THE RADICAL TRAPPING AGENT IS A HYDROXYL SUBSTITUTED POLYUNSATURATED CYCLIC COMPOUND, A NITROGENOUS COMPOUND, OR A COMBINATION THEREOF. OPTIONALLY, THE COMPOSITION COMPRISES A METAL OXIDE ABRASIVE (E.G., SILICA, ALUMINA, TITANIA, CERIA, ZIRCONIA, OR A COMBINATION OF TWO OR MORE OF THE FOREGOING ABRASIVES). |
