| 摘要 |
<p>In the present invention, disclosed are a semiconductor rectification device and a manufacturing method thereof. The semiconductor rectification device according to the present invention has a low forward voltage, a low leakage current, and a fast reverse recovery property, simplifies a manufacturing process by an improved process to form a channel, and improves a yield. And, the semiconductor rectification device according to the present invention accurately controls the formation of the channel.</p> |
