| 发明名称 |
COMPOSITION AND METHOD TO POLISH SILICON NITRIDE |
| 摘要 |
<p>THE INVENTIVE CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISES AN ABRASIVE, A NITRIDE ACCELERATOR, AND WATER, AND HAS A PH OF 1 TO 6. THE INVENTIVE METHOD OF POLISHING A SUBSTRATE INVOLVES THE USE OF THE AFORESAID POLISHING COMPOSITION AND IS PARTICULARLY USEFUL IN POLISHING A SUBSTRATE CONTAINING SILICON NITRIDE.</p> |
| 申请公布号 |
MY153685(A) |
申请公布日期 |
2015.03.13 |
| 申请号 |
MY2008PI03545 |
申请日期 |
2007.03.06 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CHEN, ZHAN;VACASSY, ROBERT;CARTER, PHILLIP;DYSARD, JEFFREY |
| 分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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