| 摘要 |
<p>PURPOSE: An apparatus for processing a substrate is provided to prevent the deformation of the wall generated when exhausting the fume using the tension formed to the sidewall of the processing chamber. CONSTITUTION: The processing chamber(110) has the space for the substrate processing process. The processing solution supply part(120) spreads the processing liquid for processing to substrate. The exhausting part(130) compulsively discharges the fume generating inside the processing chamber from the processing chamber. The tension part(140) prevents from the wall being deformed by pressure difference of the processing chamber. The tension part is made of the magnetic material. The magnetic member generates repulsion and attraction between the tension part and wall.</p> |
