Fuel System for Lithographic Apparatus, EUV Source, Lithographic Apparatus and Fuel Filtering Method

摘要

A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir (40) for retaining a volume of fuel (42), a nozzle (32), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement (44) which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.

主权项

1. A fuel supply for a radiation source comprising:
a reservoir configured to retain a volume of fuel; a nozzle, in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location; and a fuel contamination control arrangement operable to separate contamination particles from said fuel, the contamination control arrangement comprising an acoustic filter.