发明名称 METHOD FOR TRANSMITTING A BROADBAND ION BEAM AND ION IMPLANTER
摘要 A method for transmitting a broadband ion beam (100) and an ion implanter adopt an analyzing magnetic field (1), a calibration magnetic field (2) and an analyzing grating (6) to transmit a broadband ion beam. If the analyzing magnetic field (1) enables the broadband ion beam (100) emitted into the analyzing magnetic field from an incident face (101) thereof to be deflected anticlockwise in a horizontal direction, the calibration magnetic field (2) enables an ion beam diffusing again after passing through the analyzing grating (6) to be deflected clockwise in the horizontal direction; if the analyzing magnetic field (1) enables the broadband ion beam (100) emitted into the analyzing magnetic field from the incident face (101) thereof to be deflected clockwise in the horizontal direction, the calibration magnetic field (2) enables an ion beam diffusing again after passing through the analyzing grating (6) to be deflected anticlockwise in the horizontal direction. The analyzing magnetic field (1) and the calibration magnetic field (2) enable the ion beam to be deflected along different directions in the horizontal direction, so that distribution of the required ions in the broadband ion beam (100) when emitted out of the calibration magnetic field (2) from an emergence face (202) thereof is the same as the distribution when being emitted into the analyzing magnetic field.
申请公布号 US2015069261(A1) 申请公布日期 2015.03.12
申请号 US201214394591 申请日期 2012.08.06
申请人 Peng Libo;Long Huiyue;Xie Junyu 发明人 Peng Libo;Long Huiyue;Xie Junyu
分类号 H01J37/147;H01J37/317 主分类号 H01J37/147
代理机构 代理人
主权项 1. A method for transmitting a broadband ion beam, including the following steps: the analyzing magnetic field analyzes the mass of the broadband ion beam emitted into the analyzing magnetic field from an incident face thereof, so as to enable the required ions in the broadband ion beam to form a focal spot at a certain distance away from the emergence face thereof after being emitted out of the analyzing magnetic field from the emergence face thereof; an analyzing grating disposed at the focal spot selectively enables the required ions to pass therethrough; and a calibration magnetic field calibrates the angle of the ion beam which diffuses again after passing through the analyzing grating and is then emitted into the calibration magnetic field from the incident face thereof, thus to enable the ion beam which passes through the calibration magnetic field and is then emitted out of the calibration magnetic field from the emergence face thereof to have identical angle distribution, wherein the analyzing magnetic field and the calibration magnetic field are two independent magnetic fields, characterized in that, if the analyzing magnetic field enables the broadband ion beam emitted into the analyzing magnetic field from the incident face thereof to be deflected anticlockwise in the horizontal direction, the calibration magnetic field enables the ion beam diffusing again after passing through the analyzing grating to be deflected clockwise in the horizontal direction; if the analyzing magnetic field enables the broadband ion beam emitted into the analyzing magnetic field from the incident face thereof to be deflected clockwise in the horizontal direction, the calibration magnetic field enables the ion beam diffusing again after passing through the analyzing grating to be deflected anticlockwise in the horizontal direction.
地址 Beijing CN