发明名称 ANNEAL MODULE FOR SEMICONDUCTOR WAFERS
摘要 An anneal module for annealing semiconductor material wafers and similar substrates reduces particle contamination and oxygen ingress while providing uniform heating including for 500° C. processes. The anneal module may include a process chamber formed in a metal body having internal cooling lines. A hot plate has a pedestal supported on a thermal choke on the body. A gas distributor in the lid over the hot plate flows gas uniformly over the wafer. A transfer mechanism moves a hoop to shift the wafer between the hot plate and a cold plate.
申请公布号 US2015069043(A1) 申请公布日期 2015.03.12
申请号 US201314025678 申请日期 2013.09.12
申请人 APPLIED Materials, Inc. 发明人 Francischetti Vincent Steffan;Wilson Gregory J.;Hanson Kyle M.;Wirth Paul;Moore Robert B.
分类号 H01L21/324;H01L21/677;H01L21/67 主分类号 H01L21/324
代理机构 代理人
主权项 1. An anneal apparatus comprising: a metal body; a lid on the metal body with a process chamber formed between the metal body and the lid; one or more cooling lines in or on the metal body; a hot plate having a pedestal supported on a thermal choke on the body; a gas distributor in the lid over the hot plate; a cold plate on the metal body; a load slot in the metal body adjacent to the cold plate; a transfer mechanism having a hoop movable to a first position over the cold plate and to a second position over the hot plate, with the transfer mechanism also having a lifter for lifting and lowering the hoop; and at least one electronic assembly attached to the metal body.
地址 Santa Clara CA US