发明名称 |
ANNEAL MODULE FOR SEMICONDUCTOR WAFERS |
摘要 |
An anneal module for annealing semiconductor material wafers and similar substrates reduces particle contamination and oxygen ingress while providing uniform heating including for 500° C. processes. The anneal module may include a process chamber formed in a metal body having internal cooling lines. A hot plate has a pedestal supported on a thermal choke on the body. A gas distributor in the lid over the hot plate flows gas uniformly over the wafer. A transfer mechanism moves a hoop to shift the wafer between the hot plate and a cold plate. |
申请公布号 |
US2015069043(A1) |
申请公布日期 |
2015.03.12 |
申请号 |
US201314025678 |
申请日期 |
2013.09.12 |
申请人 |
APPLIED Materials, Inc. |
发明人 |
Francischetti Vincent Steffan;Wilson Gregory J.;Hanson Kyle M.;Wirth Paul;Moore Robert B. |
分类号 |
H01L21/324;H01L21/677;H01L21/67 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
1. An anneal apparatus comprising:
a metal body; a lid on the metal body with a process chamber formed between the metal body and the lid; one or more cooling lines in or on the metal body; a hot plate having a pedestal supported on a thermal choke on the body; a gas distributor in the lid over the hot plate; a cold plate on the metal body; a load slot in the metal body adjacent to the cold plate; a transfer mechanism having a hoop movable to a first position over the cold plate and to a second position over the hot plate, with the transfer mechanism also having a lifter for lifting and lowering the hoop; and at least one electronic assembly attached to the metal body. |
地址 |
Santa Clara CA US |