GROWING FILMS VIA SEQUENTIAL LIQUID/VAPOR PHASES

摘要

A method for depositing a film on a polymer substrate is disclosed. The method includes exposing a polymer substrate to a liquid comprising a first reactant to provide a plurality of reactive sites over the polymer substrate, wherein the first reactant comprises aluminum or boron; and introducing a second reactant comprising silicon in a vapor form to said plurality of reactive sites that provide a catalytic growth of the film, wherein the growth of the film is self-limited. In certain embodiments, the film can include silica, aluminum silicate, or borosilicate.