| 摘要 |
<p>An atomic layer deposition (ALD) coating system and a method for depositing an ALD layer in the system are disclosed. In an embodiment an ALD coating system includes a storage container for an organometallic starting material and a device having a control valve, a pressure gage, a pressure diaphragm and a first multiway valve, wherein the device is arranged downstream of the storage container, and wherein the first multiway valve is switchable between a process chamber and a collecting chamber.</p> |
