发明名称 SUBSTRATE PROCESSING DEVICE, CLEANING JIG, CLEANING JIG SET, AND CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device, a cleaning jig, a cleaning jig set, and a cleaning method, capable of adjusting dispersion strength of cleaning liquid.SOLUTION: Respective discharge shafts 83a (center shafts of substantially-columnar discharge ports 83) of the plurality of discharge ports 83 of a cleaning jig 80, are tilted from a centrifugal direction of rotation by a spin motor 22 and oriented to a front side of a rotation tangent line of the respective discharge ports. In addition, this directivity corresponds to a track (an allow AR2) of relative motion of pure water to a bottom face of the cleaning jig 80 at a deceleration step of decelerating a rotation speed in a state that cleaning liquid is supplied to the rotating cleaning jig 80. Therefore, at an acceleration step and a constant speed step, while a part of the pure water supplied to a liquid receiver 81 of the cleaning jig 80 is discharged from the plurality of discharge ports 83, the remaining pure water is reserved at an outer peripheral side of the liquid receiving 81. At the deceleration step, the reserved pure water is blowed out with great force from the plurality of discharge ports 83.
申请公布号 JP2015046461(A) 申请公布日期 2015.03.12
申请号 JP20130176352 申请日期 2013.08.28
申请人 SCREEN HOLDINGS CO LTD 发明人 SHIMANO TATSUYA;FUTAKI TETSUYA
分类号 H01L21/304;H01L21/027 主分类号 H01L21/304
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