发明名称 SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND METHOD FOR MANUFACTURING THE SAME
摘要 A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.
申请公布号 US2015069674(A1) 申请公布日期 2015.03.12
申请号 US201414542793 申请日期 2014.11.17
申请人 TOKYO ELECTRON LIMITED ;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY 发明人 OKESAKU Masahiro;OHMI Tadahiro;GOTO Tetsuya;MATSUOKA Takaaki;NOZAWA Toshihisa;INOKUCHI Atsutoshi;ISHIBASHI Kiyotaka
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A method of manufacturing a shower plate which is to be disposed in a plasma processing and to discharge a plasma excitation gas so as to generate plasma in the plasma processing apparatus, the method comprising: providing a first ceramic member having a plurality of vertical holes, wherein the plurality of vertical holes are to be release paths for the plasma excitation gas; fitting each of a plurality of second ceramic members into each of the vertical holes, wherein each of the second ceramic members has a plurality of gas release holes; and sintering the first ceramic member and the second ceramic members fitted into the vertical holes of the first ceramic member.
地址 Tokyo JP