发明名称 |
SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas. |
申请公布号 |
US2015069674(A1) |
申请公布日期 |
2015.03.12 |
申请号 |
US201414542793 |
申请日期 |
2014.11.17 |
申请人 |
TOKYO ELECTRON LIMITED ;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY |
发明人 |
OKESAKU Masahiro;OHMI Tadahiro;GOTO Tetsuya;MATSUOKA Takaaki;NOZAWA Toshihisa;INOKUCHI Atsutoshi;ISHIBASHI Kiyotaka |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a shower plate which is to be disposed in a plasma processing and to discharge a plasma excitation gas so as to generate plasma in the plasma processing apparatus, the method comprising:
providing a first ceramic member having a plurality of vertical holes, wherein the plurality of vertical holes are to be release paths for the plasma excitation gas; fitting each of a plurality of second ceramic members into each of the vertical holes, wherein each of the second ceramic members has a plurality of gas release holes; and sintering the first ceramic member and the second ceramic members fitted into the vertical holes of the first ceramic member. |
地址 |
Tokyo JP |