发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To easily form a semiconductor device including a plurality of capacitors having different characteristics respectively.SOLUTION: A capacity cell 60 works as a ferroelectric capacitor by a second dielectric 64 interposed between a second electrode 63 and a third electrode 65. The second dielectric 64 of the capacity cell 60 is formed by patterning a dielectric film formed on a conductor film for forming an upper electrode 53 included in a cell capacitor 50 of a memory cell. Accordingly, a capacity cell 60 having a high withstand voltage can be obtained by setting the film thickness of the second dielectric 64 at a value that is different from the film thickness of a ferroelectric 52 of the cell capacitor 50. In addition, the ferroelectric 52 of the cell capacitor 50 is formed into a thin film to obtain a cell capacitor 50.
申请公布号 JP2015046554(A) 申请公布日期 2015.03.12
申请号 JP20130178209 申请日期 2013.08.29
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 MATSUURA OSATAKE
分类号 H01L21/8246;H01L27/10;H01L27/105 主分类号 H01L21/8246
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