发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To easily form a semiconductor device including a plurality of capacitors having different characteristics respectively.SOLUTION: A capacity cell 60 works as a ferroelectric capacitor by a second dielectric 64 interposed between a second electrode 63 and a third electrode 65. The second dielectric 64 of the capacity cell 60 is formed by patterning a dielectric film formed on a conductor film for forming an upper electrode 53 included in a cell capacitor 50 of a memory cell. Accordingly, a capacity cell 60 having a high withstand voltage can be obtained by setting the film thickness of the second dielectric 64 at a value that is different from the film thickness of a ferroelectric 52 of the cell capacitor 50. In addition, the ferroelectric 52 of the cell capacitor 50 is formed into a thin film to obtain a cell capacitor 50. |
申请公布号 |
JP2015046554(A) |
申请公布日期 |
2015.03.12 |
申请号 |
JP20130178209 |
申请日期 |
2013.08.29 |
申请人 |
FUJITSU SEMICONDUCTOR LTD |
发明人 |
MATSUURA OSATAKE |
分类号 |
H01L21/8246;H01L27/10;H01L27/105 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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