| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device capable of uniform cleaning of a sample observed by a scanning electron microscope.SOLUTION: A sample observation 14a is exposed uniformly to a plasma space 16 generated above an electrode 4, by arranging rods 25 on the first bottom wall 2b of a processing chamber 1 near the electrode 4 at a predetermined interval, and then fitting the dovetail groove 22f of a dovetail groove holder 22 and the rod 25. Furthermore, since the sample observation 14a is arranged near the electrode 4 in the plasma space 16 where the density of ions, ozone, radicals, and the like, is high, it is strongly affected by chemical reaction with ions, ozone, radicals, and the like, and thereby is cleaned efficiently. |
