ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an illumination optical system which can realize illumination conditions rich in variety and can improve device productivity when it is applied to an exposure apparatus.SOLUTION: The illumination optical system is designed to illuminate an irradiated surface on the basis of light from a light source (1), comprising: a first optical path in which a diffraction optical element (6) is disposed at a first position thereof; a second optical path in which a spatial light modulator (3) including a plurality of optical elements (3a) two dimensionally arrayed and individually controlled is disposed at a second position thereof; and a third optical path which is a path for light having passed through at least one side of the first optical path and the second optical path, in which a distribution formation optical system (11) is disposed. The distribution formation optical system (11) forms a designated distribution of light intensity at an illumination pupil located in the third optical path on the basis of the light having passed through at least one side of the first and the second optical paths.