| 摘要 |
A projection exposure apparatus for projection lithography comprises a light source for generating illumination light. An illumination optical unit guides the light to an object field. A catadioptric projection optical unit with at least one curved mirror images an object in the object field onto a substrate in an image field. An object displacement drive- and a substrate displacement drive serve to displace the object and the substrate. A compensation device serves to compensate aberrations of the projection optical unit, which are caused by an arching of the object or the substrate. The compensation device comprises a wavelength manipulation device for manipulating a wavelength of the illumination light during the projection exposure. The result of this is a projection exposure apparatus in which the imaging quality of the projection optical unit is optimized, particularly taking into account a field curvature. |
