发明名称 VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS
摘要 A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.
申请公布号 US2015072453(A1) 申请公布日期 2015.03.12
申请号 US201414177180 申请日期 2014.02.10
申请人 Samsung Display Co., Ltd. 发明人 Jang Choel-Min;Key Sung-Hun;Kim In-Kyo;Jung Suk-Won;Huh Myung-Soo
分类号 H01L51/00;H01L51/56 主分类号 H01L51/00
代理机构 代理人
主权项 1. A vapor deposition apparatus for depositing thin films on a substrate, the vapor deposition apparatus comprising: a supply unit comprises a plurality of linear supply members configured to supply at least one gas; and a nozzle unit comprising a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.
地址 Yongin-City KR