发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device including an oxide semiconductor that is miniaturized and has favorable electrical characteristics is provided. The semiconductor device includes an oxide semiconductor film and a blocking film; a source electrode and a drain electrode electrically connected to the oxide semiconductor film; a gate insulating film in contact with the oxide semiconductor film, the source electrode, and the drain electrode; and a gate electrode in contact with the gate insulating film. The blocking film contains the same material as the oxide semiconductor film, is on the same surface as the oxide semiconductor film, and has a higher conductivity than the oxide semiconductor film. |
申请公布号 |
US2015069383(A1) |
申请公布日期 |
2015.03.12 |
申请号 |
US201414474450 |
申请日期 |
2014.09.02 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
Suzuki Yasutaka;Hata Yuki;Ieda Yoshinori |
分类号 |
H01L29/786;H01L29/423;H01L29/51 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
an oxide semiconductor film and a blocking film; a source electrode and a drain electrode electrically connected to the oxide semiconductor film; and a gate electrode overlapping with the oxide semiconductor film with a gate insulating film interposed therebetween, wherein the blocking film contains the same material as the oxide semiconductor film, is on the same surface as the oxide semiconductor film, and has a higher conductivity than the oxide semiconductor film. |
地址 |
Atsugi-shi JP |