发明名称 |
THIN FILM TRANSISTORS, METHODS OF MANUFACTURING THE SAME AND DISPLAY DEVICES INCLUDING THE SAME |
摘要 |
A thin film transistor includes a gate electrode on a substrate, a gate insulation layer which covers the gate electrode on the substrate, an oxide semiconductor pattern which is disposed on the gate insulation layer and includes a channel portion superimposed over the gate electrode, and low resistance patterns provided at edges of the channel portion, respectively, and including oxygen vacancies, a channel passivation layer on the oxide semiconductor pattern, a reaction layer which covers the oxide semiconductor pattern and the channel passivation layer, and includes a metal oxide, and a source electrode and a drain electrode which contact the oxide semiconductor pattern. |
申请公布号 |
US2015069336(A1) |
申请公布日期 |
2015.03.12 |
申请号 |
US201414174989 |
申请日期 |
2014.02.07 |
申请人 |
Samsung Display Co., LTD. |
发明人 |
OKUMURA Hiroshi;LEE Je-Hun;PARK Jin-Hyun |
分类号 |
H01L27/12;H01L27/32 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A thin film transistor, comprising:
a gate electrode on a substrate; a gate insulation layer which covers the gate electrode on the substrate; an oxide semiconductor pattern which is disposed on the gate insulation layer and includes:
a channel portion superimposed over the gate electrode; andlow resistance patterns provided at edges of the channel portion, respectively, and including oxygen vacancies; a channel passivation layer on the oxide semiconductor pattern; a reaction layer which covers the oxide semiconductor pattern and the channel passivation layer, and includes a metal oxide; and a source electrode and a drain electrode which contact the oxide semiconductor pattern. |
地址 |
Yongin-City KR |