发明名称 THIN FILM TRANSISTORS, METHODS OF MANUFACTURING THE SAME AND DISPLAY DEVICES INCLUDING THE SAME
摘要 A thin film transistor includes a gate electrode on a substrate, a gate insulation layer which covers the gate electrode on the substrate, an oxide semiconductor pattern which is disposed on the gate insulation layer and includes a channel portion superimposed over the gate electrode, and low resistance patterns provided at edges of the channel portion, respectively, and including oxygen vacancies, a channel passivation layer on the oxide semiconductor pattern, a reaction layer which covers the oxide semiconductor pattern and the channel passivation layer, and includes a metal oxide, and a source electrode and a drain electrode which contact the oxide semiconductor pattern.
申请公布号 US2015069336(A1) 申请公布日期 2015.03.12
申请号 US201414174989 申请日期 2014.02.07
申请人 Samsung Display Co., LTD. 发明人 OKUMURA Hiroshi;LEE Je-Hun;PARK Jin-Hyun
分类号 H01L27/12;H01L27/32 主分类号 H01L27/12
代理机构 代理人
主权项 1. A thin film transistor, comprising: a gate electrode on a substrate; a gate insulation layer which covers the gate electrode on the substrate; an oxide semiconductor pattern which is disposed on the gate insulation layer and includes: a channel portion superimposed over the gate electrode; andlow resistance patterns provided at edges of the channel portion, respectively, and including oxygen vacancies; a channel passivation layer on the oxide semiconductor pattern; a reaction layer which covers the oxide semiconductor pattern and the channel passivation layer, and includes a metal oxide; and a source electrode and a drain electrode which contact the oxide semiconductor pattern.
地址 Yongin-City KR