发明名称 Ni-BASED ALLOY EXCELLENT IN HOT FORGEABILITY, HIGH-TEMPERATURE OXIDATION RESISTANCE AND RESISTANCE TO HIGH-TEMPERATURE HALOGEN GAS CORROSION AND MEMBER USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an Ni-based alloy which is suitable as a constituent material for baking trays for chip capacitors, baking trays for lithium cell positive electrode materials, members of CVD apparatuses, members of PVD apparatuses, members of LCD apparatuses, members of semiconductor production apparatuses, etc. and excellent in hot forgeability, high-temperature oxidation resistance and resistance to high-temperature halogen corrosion.SOLUTION: An Ni-based alloy comprises, by wt.%, 2.0-5.0% of Al, 0.1-2.5% of Si, 0.1-1.5% of Mn, 0.001-0.01% of B, 0.001-0.1% of Zr and remaining Ni and unavoidable impurities and is excellent in hot forgeability, high-temperature oxidation resistance and resistance to high-temperature halogen corrosion.
申请公布号 JP2015045035(A) 申请公布日期 2015.03.12
申请号 JP20130175389 申请日期 2013.08.27
申请人 HITACHI METALS MMC SUPERALLOY LTD;HITACHI METALS LTD 发明人 SAKAI HIROKAZU;SUGAWARA KATSUO
分类号 C22C19/03;H01G13/00 主分类号 C22C19/03
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