发明名称 INSPECTION METHOD, MANUFACTURING METHOD FOR NANOIMPRINT MOLD, NANOIMPRINT METHOD, AND INSPECTION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an inspection method and the like for making it possible to inspect a bottom surface of a depression of a depression-included nanoimprint substrate or depression-included nanoimprint mold.SOLUTION: An inspection method for inspecting a foreign object existing at a substrate part P having a pair of a first face (upper face) and second face in a nanoimprint structure body 5 comprising the substrate part and a retention part R formed on the first face side in order to retain the substrate part P performs an inspection by: setting a radiation part 10 for radiating inspection light capable of permeating the substrate part; setting a light receiving part 20 which is provided on the second face side and includes a lens 22 and a light receiving face for receiving the inspection light having permeated the substrate part, through the lens; adjusting a focus of the lens so that an image projected on the light receiving face of the light receiving part by the inspection light having permeated the substrate part fits the first face; and determining whether or not a foreign object exists on the first face, on the basis of the image projected on the light receiving face of the light receiving part.</p>
申请公布号 JP2015046490(A) 申请公布日期 2015.03.12
申请号 JP20130176874 申请日期 2013.08.28
申请人 DAINIPPON PRINTING CO LTD 发明人 ARITSUKA YUKI
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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