发明名称 MONOCRYSTALLINE SILICON WAFER TEXTURIZING ADDITIVE AND USE THEREOF
摘要 The invention provides a monocrystalline silicon wafer texturizing additive, comprising the following components: polyethylene glycol, sodium benzoate, citric acid, hydrolytic polymaleic anhydride, sodium acetate and the balance being water. The invention also provides a texturizing solution for texturizing of the monocrystalline silicon wafer. The above-mentioned texturizing solution comprises a base solution and the texturizing additive, wherein the mass ratio of the texturizing additive to the base solution is 0.2-5:100; the base solution is an aqueous solution of an inorganic or organic base. The invention also provides a texturizing method for a monocrystalline silicon wafer, comprising surface-texturizing the monocrystalline silicon wafer using the above-mentioned texturizing solution. When the above-mentioned monocrystalline silicon wafer texturizing additive is applied to the manufacturing of a surface-texturized monocrystalline silicon wafer, there is no need to use a large amount of isopropanol or ethanol, so the chemical oxygen demand of the texturizing solution is greatly reduced, and uniform, fine and dense textured pyramids can be obtained, thus, the texturizing cost can be reduced, environmental pollution is reduced, facilitating the stabilization of a process for a crystalline silicon solar cell, and having a better practical value.
申请公布号 WO2015032153(A1) 申请公布日期 2015.03.12
申请号 WO2013CN89672 申请日期 2013.12.17
申请人 CHANGZHOU SHICHUANG ENERGY TECHNOLOGY CO., LTD. 发明人 FU, LIMING;CHEN, PEILIANG
分类号 C03B33/10;H01L31/18 主分类号 C03B33/10
代理机构 代理人
主权项
地址
您可能感兴趣的专利