| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask blank capable of forming an extremely minute pattern, and to provide a photomask with a minute pattern formed on the photomask blank. <P>SOLUTION: The photomask blank has a light-shielding film comprising at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon, and an antireflective layer laminated on the upper surface of the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon. <P>COPYRIGHT: (C)2010,JPO&INPIT |
