| 摘要 |
The present invention relates to an exposure apparatus of a roll to roll method which allows dust elimination of a pattern surface of a mask plate to be automatically performed without affecting exposure movement. The exposure apparatus comprises: an exposure stage (240) capable of being elevated with a substrate (W) along an z axis while having an exposure table (241) maintaining the substrate (W); a mask dust elimination part (230) which performs dust elimination movement on a pattern surface M of a mask plate (210) while being performed in a working range by setting a gap between a fist position x1 separated along an x axis from an end (210a) of a rear of the mask plate (210) at a constant distance and a second position x4 separated from an end (210b) of a front of the mask plate (210) along the x axis at a constant distance as the working range in reciprocating movement; a mask dust elimination control device (400) which controls the reciprocating movement of the mask dust elimination part (230); and an exposure stage control device (500) which controls the elevation of the exposure stage (240). |
