发明名称 Laser annealing device and laser annealing method using a pulsed laser diode
摘要 <p>A generil pulse waveform rises sharply from a starting time point of oscillation, shows a peak, and thereafter, decreases gently. At the time point when power shows a peak, the surface of an annealing object (30) is sharply heated and reaches a high temperature. Since time showing the peak is an instant, it is difficult to sufficiently heat a deep region of an annealing object (30). A laser pulse is emitted from a laser diode (12) when a pulse current is input. An optical system (13,15,16,19,20) that guides a laser beam emitted from the laser diode (12) to an annealing object (30). A driver (10) supplies a pulse current that has a time waveform of a top flat and a pulse width of 1 µs to 100 µs to the laser diode (12).</p>
申请公布号 EP2574418(B1) 申请公布日期 2015.03.11
申请号 EP20120006381 申请日期 2012.09.11
申请人 SUMITOMO HEAVY INDUSTRIES, LTD. 发明人 WAKABAYASHI, NAOKI;YOROZU, MASAFUMI
分类号 B23K26/00;B23K26/06;B23K26/073;H01L21/265;H01L21/268 主分类号 B23K26/00
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