发明名称 |
MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND STORAGE MEDIUM |
摘要 |
A magnetron sputtering apparatus includes a target disposed to face a substrate mounted on a mounting part in a vacuum vessel and a magnet arrangement assembly installed at a back side of the target and having an array of magnets, the magnetron sputtering apparatus including: a gas supply part configured to supply a plasma generation gas into the vacuum vessel; a rotary mechanism configured to rotate the mounting part; a power supply part configured to apply a voltage to the target; a moving mechanism configured to move the magnet arrangement assembly between a first region and a second region; and a control unit configured to output a control signal, such that an average moving speed of the magnet arrangement assembly is different between the first region and the second region. |
申请公布号 |
KR20150027053(A) |
申请公布日期 |
2015.03.11 |
申请号 |
KR20147032117 |
申请日期 |
2013.04.11 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NAKAMURA KANTO;KITADA TORU;GOMI ATSUSHI;MIYASHITA TETSUYA |
分类号 |
C23C14/35;H01L21/203;H01L21/28 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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