| 摘要 |
<p>Disclosed is a sputtering target that does not cause abnormal discharge in sputtering and can form a transparent electrode having a low specific resistance and a high plasma resistance. Also disclosed is a process for producing a zinc oxide sintered compact containing a first additive element (one or more elements selected from Al, Ga, In, Ti, Si, Ge, and Sn) to zinc oxide (ZnO) and V particularly as a second additive element for enhancing the resistance of the electrode to plasma. According to the production process, a calcined powder including a ZnAl2O4 phase and a Zn3(VO4)2 phase is first produced. The calcined powder and a ZnO powder are mixed together, and the mixture is molded and fired to produce a zinc oxide sintered compact.</p> |
