发明名称 Method and apparatus for chemical-mechanical polishing
摘要 <p>In accordance with certain embodiments, a method can be utilized that includes depositing a backfill material layer over a reader stack; depositing a chemical-mechanical-polishing stop layer above the layer of backfill material; and depositing a sacrificial layer on top of the chemical-mechanical-polishing stop layer. </p>
申请公布号 EP2779168(A3) 申请公布日期 2015.03.11
申请号 EP20140159077 申请日期 2014.03.12
申请人 SEAGATE TECHNOLOGY LLC 发明人 SINGLETON, ERIC WALTER;MCKINLAY, SHAUN ERIC;WAKEHAM, STACEY CHRISTINE
分类号 G11B5/39;G11B5/31 主分类号 G11B5/39
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