发明名称 プロセスチャンバの圧力制御システムおよび制御方法
摘要 <p>A method of and apparatus for controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve, wherein either the open time or closed time, or both open and closed times, is lengthened or shortened, depending on whether the gauge pressure is above or below the programmed setpoint.</p>
申请公布号 JP5683697(B2) 申请公布日期 2015.03.11
申请号 JP20130519636 申请日期 2010.07.14
申请人 发明人
分类号 H01L21/3065;H01L21/31 主分类号 H01L21/3065
代理机构 代理人
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