发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 <p>[Objective] Provided is a charged particle beam apparatus capable of preventing a damage layer from being formed on the surface of a specimen. [Solution] It includes an electron beam irradiation part which irradiates an electron beam of a first irradiation axis to a specimen, a rotation stage which can maintain the specimen and a rotation axis vertical to the first irradiation axis, an ion beam irradiation part which irradiates an ion beam of a second irradiation axis parallel to the rotation axis to the specimen, a detection part which detects at least one side of light or charged particles generated though the specimen by the ion beam and the electron beam irradiation, and a gas ion beam irradiation part which irradiates a gas ion beam to the specimen.</p>
申请公布号 KR20150026971(A) 申请公布日期 2015.03.11
申请号 KR20140114182 申请日期 2014.08.29
申请人 HITACHI HIGH-TECH SCIENCE CORPORATION 发明人 MAN XIN;ASAHATA TATSUYA;UEMOTO ATSUSHI
分类号 H01J37/04;H01J37/20 主分类号 H01J37/04
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