Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers

摘要

The present invention relates to a process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers which is deposited on a surface or in a mold. Block copolymers are characterized by the possession of at least one of the constituent monomers respectively of each of the blocks of the block copolymers identical but exhibit different molecular weights. The control process is targeted at obtaining thicknesses of films or objects, with few nanostructuring defects, which are sufficiently great for the treated surface to be able to be used as masks for applications in microelectronics or for the objects resulting therefrom to exhibit previously unpublished mechanical, acoustic or optical characteristics.