FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS

摘要

The present invention is to provide a film deposition method capable of stably supplying a raw gas. It is a film deposition method of evaporating raw monomers in corresponding vaporizers, supplying them to a film deposition apparatus, and forming an organic layer on a base by deposition polymerization. Before the deposition polymerization, it includes a process of removing impurity which removes impurity from at least one among the raw monomers.