发明名称 |
PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE COMPOSITION, PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE LAYER, AND PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE SHEET |
摘要 |
Provided is a photocurable pressure-sensitive adhesive composition which does not cause oozing under ordinary temperature and pressure conditions and exhibits sufficient initial tack via drying and crosslinking. The photocurable pressure-sensitive adhesive composition is easily curable by light irradiation and can form a curable pressure-sensitive adhesive layer having high peel resistance. Also provided are a photocurable pressure-sensitive adhesive layer and a photocurable pressure-sensitive adhesive sheet. A photocurable pressure-sensitive adhesive composition is prepared which comprises a graft polymer obtained by grafting a chain that contains a monomer bearing a cyclic ether group onto a (meth)acrylic polymer that contains 0.2 to 10% by weight of hydroxyalkyl(meth)acrylamide monomer units, and a cationic photopolymerization initiator. A photocurable pressure-sensitive adhesive layer using such composition and a photocurable pressure-sensitive adhesive sheet are also prepared. |
申请公布号 |
EP2508583(A4) |
申请公布日期 |
2015.03.11 |
申请号 |
EP20100834567 |
申请日期 |
2010.12.01 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
FUJITA,SHIGERU;MOROISHI,YUTAKA;NAKANO,FUMIKO;INOUE,TETSUO |
分类号 |
C09J151/00;C08F265/06;C09J7/02;C09J11/06 |
主分类号 |
C09J151/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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