发明名称 SUBSTRATE TREATING APPARATUS, CLUSTER EQUIPMENT FOR TREATING SUBSTRATE, AND SUBSTRATE TRANSFERING METHOD
摘要 <p>The present invention relates to a substrate treating apparatus, cluster equipment for treating a substrate, and a substrate transferring method. The substrate treating apparatus according to an embodiment of the present invention comprises: a load port receiving a cassette in which the substrate is loaded; a first lock chamber and a second load lock chamber which inner pressure can be selectively convertible between atmospheric pressure and vacuum pressure; a first substrate transfer robot transferring the substrate between the load port and a load lock chamber; a process treatment module including a process chamber treating a substrate load unit on which the substrates are loaded and the loaded substrates; a second substrate transfer robot: transferring the substrate between the load lock chamber and the substrate load unit; and a control unit which controls the operation of the substrate treating apparatus, disperses and transfers the substrates loaded in the substrate load unit to the first load lock chamber and the second load lock chamber, and controls the second load lock chamber to be converted into the vacuum condition when the final substrate stored in the first load lock chamber is transferred to the substrate load unit.</p>
申请公布号 KR20150026381(A) 申请公布日期 2015.03.11
申请号 KR20130105135 申请日期 2013.09.02
申请人 KOOKJE ELECTRIC KOREA CO., LTD. 发明人 PARK, YONG SUNG;LEE, SOUNG KWANG
分类号 H01L21/677;H01L21/02 主分类号 H01L21/677
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