PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE

摘要

The present invention relates to a photoacid generator and uses of a photoresist composition. The photoacid generator compound is represented by chemical formula 1 and is included in the photoresist composition. A coated substrate including the photoresist composition can be formed as a circular wafer having measurements of the diameter of 200 mm or 300 mm, or different measurements useful for assembly manufacture of a wafer.