发明名称 Device and method for the thermal treatment of corrosive gases
摘要 A device for thermal treatment of corrosive gases includes a chamber for heating gases in which there are at least four heating elements or four groups of heating elements including an electrically conductive material, wherein each heating element or group is connected to a separately regulatable and/or controllable subsystem of an electrical energy network and can thereby be heated by direct current flow, wherein each heating element or group can be controlled or regulated with respect to at least one either identical or different value of a parameter selected from the group consisting of temperature, heating power, current, voltage and resistance, or with respect to another heating element process variable, which can be influenced by the device, and wherein at least four regulatable and/or controllable subsystems are DC-isolated from ground potential. The invention also relates to a corresponding method for the thermal treatment of corrosive gases.
申请公布号 US8977114(B2) 申请公布日期 2015.03.10
申请号 US201213489442 申请日期 2012.06.05
申请人 Wacker Chemie AG 发明人 Ellinger Norbert;Wiesbauer Josef;Ring Robert
分类号 H05B3/60;B01J19/02;B01J19/00;B01J19/08 主分类号 H05B3/60
代理机构 Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd. 代理人 Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd.
主权项 1. A method for the thermal treatment of corrosive gases, wherein gases contained in a chamber are heated by at least four heating elements or four groups of heating elements comprising an electrically conductive material, wherein each heating element or each group of heating elements is connected to a separately regulatable and/or controllable subsystem of an electrical energy network, wherein each heating element or each group of heating elements is regulated and/or controlled separately and is heated by direct current flow, wherein each separately regulatable and/or controllable heating element or each separately regulatable and/or controllable group of heating elements is controlled or regulated with respect to at least one either identical or different value of a parameter selected from the group consisting of temperature, heating power, current, voltage and resistance or with respect to another heating element process variable, which can be influenced by the device, and wherein at least four regulatable and/or controllable subsystems are DC-isolated from ground potential and from one another.
地址 Munich DE