| 摘要 |
The present invention relates to a substrate mounting apparatus which mounts a substrate thereon. The substrate mounting apparatus comprises: a mounting table on which the substrate is mounted; a plurality of suction channels which are formed to pass through at least one portion of the mounting table in a vertical direction, are arranged in a width direction of the mounting table, and support the substrate by vacuum suction; a plurality of bent channels which are formed to pass through at least one portion of the mounting table in the vertical direction, are arranged in the width direction of the mounting table so as to be located between the plurality of suction channels, and allow a gas between the substrate and the mounting table to leave out; and a plurality of substrate supporters which are arranged in the width direction of the mounting table and elevate to load and unload the substrate. According to various embodiments of the present invention, a bottom surface of the substrate is closely contacted on the mounting table sequentially from a center region to an edge region. Therefore, when a large substrate mounts on the mounting table as in the prior art, it is possible to prevent a slip phenomenon caused by a self-weight of the substrate. It is possible to prevent a misalignment of the substrate. Since it is unnecessary to align the substrate again, a process time can be reduced. |
