| 发明名称 |
Combinatorial spin deposition |
| 摘要 |
A spin deposition apparatus includes a deposition mask configured to be arranged proximate a target substrate. The deposition mask includes at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the target substrate. |
| 申请公布号 |
US8973524(B2) |
申请公布日期 |
2015.03.10 |
| 申请号 |
US201213685961 |
申请日期 |
2012.11.27 |
| 申请人 |
Intermolecular, Inc. |
发明人 |
Endo Richard R.;Kelekar Rajesh |
| 分类号 |
B05C11/11;B05C11/115;B05D1/00;B05D1/32 |
主分类号 |
B05C11/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A spin deposition apparatus, comprising:
a deposition mask configured to be arranged proximate a substrate, the deposition mask comprising at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the substrate, wherein the deposition mask further comprises at least one radial seal extending radially outward from an area proximate the rotational axis of the deposition mask to an edge of the deposition mask. |
| 地址 |
San Jose CA US |
