Fine-processing agent and fine-processing method

摘要

Provided is a fine-processing agent which, when fine-processing a laminated film stacked at least with a silicon dioxide film and a silicon nitride film, can selectively fine-process the silicon dioxide film. Also provided is a fine-processing method utilizing the fine-processing agent. The fine-processing agent is characterized by including: (a) 0.01-15.0 weight % hydrogen fluoride and/or 0.1-40.0 weight % ammonium fluoride, (b) water, and (c) 0.001-10.00 weight % water-soluble polymer selected from among a group consisting of acrylic acid, ammonium acrylate, acrylic acid ester, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.

主权项

1. A fine processing agent that provides etching and cleaning of a surface of a target film, comprising:
(a) 0.01 to 15% by weight of hydrogen fluoride and 0.1 to 40% by weight of ammonium fluoride; (b) water; and (c) 0.001 to 10% by weight of a water-soluble polymer of at least one selected from the group consisting of styrenesulfonic acid and ammonium styrenesulfonate, wherein said fine processing agent has an etch rate in the range of 1 to 5,000 nm/minute for a silicon oxide film at 25° C.