| 发明名称 | Process for producing glass substrate provided with aluminum oxide-containing silicon oxide film | ||
| 摘要 | A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, and a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane and an organic aluminum complex is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass ribbon. | ||
| 申请公布号 | US8973403(B2) | 申请公布日期 | 2015.03.10 |
| 申请号 | US201213710780 | 申请日期 | 2012.12.11 |
| 申请人 | Asahi Glass Company, Limited | 发明人 | Kuwahara Yuichi;Abe Keisuke |
| 分类号 | C03C17/25;C03C17/00 | 主分类号 | C03C17/25 |
| 代理机构 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, comprising applying a coating liquid comprising an organopolysiloxane and an organic aluminum complex to a glass substrate which is at a temperature of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, wherein the content of the organic aluminum complex to the content of the organopolysiloxane in the coating liquid is from 0.005 to 0.25 by mass ratio. | ||
| 地址 | Chiyoda-ku JP | ||