| 摘要 |
<p>The present invention relates to a chamber arrangement structure of a substrate cleaning apparatus. As a chamber structure of the substrate cleaning device which performs multi-step cleaning processes while transferring a substrate by a transfer arm, the present invention includes a plurality of cleaning chambers which include inlets to input the substrate and outlets to output the substrate, wherein, two or more cleaning chambers are arranged with a preset space to form a motion space of the transfer arm between the cleaning chambers, and an inlet nozzle which sprays fluid on the surface of the substrate. Provided is the chamber arrangement structure of the substrate cleaning apparatus capable of improving cleaning efficiency by preventing different chemical from being inputted in the cleaning process of the cleaning chamber by inputting the fluid removing the remaining solutions such as chemical which is used in a previous process and remains on the surface of substrate by spraying the fluid with high pressure on the surface of the substrate which is inputted to the chamber when the motion space of the transfer arm is formed between the cleaning chambers.</p> |
