发明名称 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus
摘要 The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
申请公布号 US8975599(B2) 申请公布日期 2015.03.10
申请号 US200711797505 申请日期 2007.05.03
申请人 ASML Netherlands B.V. 发明人 Staals Frank;Lof Joeri;Loopstra Erik Roelof;Tel Wim Tjibbo;Moest Bearrach
分类号 G01J1/04;G21K5/10;G03F7/20;G03F9/00 主分类号 G01J1/04
代理机构 Sterne, Kessler, Goldstein & Fox P.L.L.C 代理人 Sterne, Kessler, Goldstein & Fox P.L.L.C
主权项 1. A lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder, comprising: an image sensor comprising: an image detector; and a lens arranged to project at least part of an aerial image of an alignment mark onto said image detector; wherein said image sensor is positioned within said substrate holder such that said lens is positioned proximate said substrate plane; and a patterning device comprising the pattern, wherein the pattern includes the alignment mark that is of comparable dimensions to critical dimension features of the pattern.
地址 Veldhoven NL