发明名称 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM
摘要 <p>The present invention is to improve productivity. A substrate processing method according to an aspect of an embodiment comprises: a treatment liquid supply process of supplying treatment liquid containing a volatile component to form a film on the substrate with a substrate conducted with pretreatment requiring atmosphere management or time management after treatment; and an accommodation process of accommodating the substrate where the treatment liquid is aged or hardened as the volatile component volatilizes.</p>
申请公布号 KR20150024795(A) 申请公布日期 2015.03.09
申请号 KR20140111578 申请日期 2014.08.26
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO MIYAKO;ORII TAKEHIKO;KANNO ITARU
分类号 H01L21/3065;H01L21/302 主分类号 H01L21/3065
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