发明名称 |
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM |
摘要 |
<p>The present invention is to improve productivity. A substrate processing method according to an aspect of an embodiment comprises: a treatment liquid supply process of supplying treatment liquid containing a volatile component to form a film on the substrate with a substrate conducted with pretreatment requiring atmosphere management or time management after treatment; and an accommodation process of accommodating the substrate where the treatment liquid is aged or hardened as the volatile component volatilizes.</p> |
申请公布号 |
KR20150024795(A) |
申请公布日期 |
2015.03.09 |
申请号 |
KR20140111578 |
申请日期 |
2014.08.26 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KANEKO MIYAKO;ORII TAKEHIKO;KANNO ITARU |
分类号 |
H01L21/3065;H01L21/302 |
主分类号 |
H01L21/3065 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|