发明名称 GAS DISTRIBUTION UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME
摘要 A gas spray unit according to the present invention is formed to be extend in at least one direction and has a cylindrical shape which has an injector having multiple spray holes spraying process gas and an internal space where the lower part of the injector is inserted. The gas spray unit includes an adaptor installed to be placed in the lower part of the injector in the internal space, including an elastic member elastically supporting the injector and combined with the injector. According to an embodiment of the present invention, the present invention connects mutually the injector formed to extend in a vertical direction and a gas inducing unit formed to extend in a width direction (or a horizontal direction) and having a length shorter than the injector by arranging the adaptor formed of metal. In other words, the injector is connected with the gas inducing unit by the adaptor by separately composing the injector, the adaptor, and the gas inducing unit without directly coupling the injector with the gas inducing unit as in the past. The coupling structure like the forementioned has a simple alphabet ′L′ shape as in an existing structure, enables a firm coupling in comparison with a coupling structure directly connecting the injector formed of quartz with the gas inducing unit, and prevents a problem of damaging a lower nozzle part of the injector.
申请公布号 KR101499100(B1) 申请公布日期 2015.03.06
申请号 KR20130109182 申请日期 2013.09.11
申请人 THERMTECS CO., LTD. 发明人 CHO, MIN CHUL
分类号 H05H1/34;H05H1/46 主分类号 H05H1/34
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