| 发明名称 |
PROCEDE DE FABRICATION DE COUCHES DE POLISSAGE DE PATIN DE POLISSAGE CHIMIQUE -MECANIQUE AYANT DES DEFAUTS D'INCLUSION DE GAZ REDUITS |
| 摘要 |
<p>A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.</p> |
| 申请公布号 |
FR2944725(B1) |
申请公布日期 |
2015.03.06 |
| 申请号 |
FR20100053153 |
申请日期 |
2010.04.26 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
ESBENSHADE JOHN;GEIGER ANDREW M.;LIBBERS PAUL;NOVEMBER SAMUEL J.;SACCHETTI PAUL J.;TRACY JONATHAN;VERBARO DAVID;WATKINS MICHAEL E. |
| 分类号 |
B24D18/00 |
主分类号 |
B24D18/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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